A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films

Wiley Online Library·Feb 19

This story is reported by Wiley Online Library. Read what other outlets are saying below, then open the original report for full details.

Full coverage

1

Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon

Nature·Mar 6

2

Plasma-assisted fabrication of multiscale materials for electrochemical energy conversion and storage

Wiley Online Library·Dec 6

3

/Si substrates for large-scale transfer of graphene

Nature·Jun 23

4

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next-generation rigid and flexible device applications

Wiley Online Library·Aug 6